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Electron-Impact Excitation Collision Strengths and Theoretical Line Intensities for Fine-Structure Transitions in S III

机译:电子碰撞激励碰撞强度与理论线   s III中精细结构转变的强度

摘要

We present Maxwellian-averaged effective collision strengths for theelectron-impact excitation of S III over a wide range of electron temperaturesof astrophysical importance, log T(K) = 3.0-6.0. The calculation incorporates53 fine-structure levels arising from the six lowest configurations, givingrise to 1378 individual lines, and is undertaken using the recently developedRMATRX II plus FINE95 suite of codes. A detailed comparison is made with aprevious R-matrix calculation and significant differences are found for sometransitions. The atomic data are subsequently incorporated into the modelingcode CLOUDY to generate line intensities for a range of plasma parameters, withemphasis on allowed UV and EUV emission lines detected from the Io plasmatorus. Electron density-sensitive line ratios are calculated with the presentatomic data and compared with those from CHIANTI v7.1, as well as with Ioplasma torus spectra obtained by FUSE and EUVE. The present line intensitiesare found to agree well with the observational results and provide a noticeableimprovement upon the values predicted by CHIANTI.
机译:我们提出了在天体重要性的大范围电子温度下,S III的电子撞击激发的麦克斯韦平均有效碰撞强度,log T(K)= 3.0-6.0。该计算合并了由六个最低配置产生的53个精细结构级别,从而产生了1378条单独的行,并使用最近开发的RMATRX II加FINE95代码套件进行了计算。与先前的R矩阵计算进行了详细的比较,发现某些转换存在明显差异。随后将原子数据合并到建模代码CLOUDY中,以生成一系列等离子体参数的谱线强度,重点是从Io等离子体台检测到的允许的UV和EUV发射谱线。电子密度敏感的线比率是用当前的原子数据计算的,并与CHIANTI v7.1以及通过FUSE和EUVE获得的Ioplasma圆环光谱进行比较。发现当前的线强度与观测结果非常吻合,并且对CHIANTI预测的值提供了显着的改进。

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